Lithography相关论文
Simple and efficient nanofabrication technology with low cost and high flexibility is indispensable for fundamental nano......
Supramolecular Self-assembling at Functionalized Surfaces/interfaces by Using Designed Functional Sm
This work is principally engaged in the supramolecular chemistry at functionalized surfaces/interfaces.Based on independ......
In 2015 the Austrian Austrian Research Promotion Agency(FFG)started a national lead project "Additive Manufacturing Tec......
Fabrication of ordered nanoseale structures is crucial for the manufacture of integrated circuits (CPUs RAM etc), next g......
State of the art laser-produced plasma (LPP) sources of extreme ultraviolet radiation for lithographic applications make......
基于时域有限差分法(FDTD)对一维金属线栅结构在0.2~2.6 THz波段的偏振特性进行了数值分析，研究了其结构参数如金属占空比、狭缝宽......
针对光刻机照明系统的实际应用需求,提出了一种光瞳特性参数的评估算法。该算法通过对光瞳强度分布进行转换,可以在不同照明模式下......
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Thermo-mechanical dynamics of nanoimprinting anti-reflective structures onto small-core mid-IR chalc
Thermal nanoimprinting is a fast and versatile method for transferring the anti-reflective properties of subwavelength n......
针对纳米光栅的加工需求，提出一种以柱形光栅耦合结构为基础的单模共振干涉光刻方法。该方法以柱形光栅耦合结构为掩模，结合光刻胶和......
正弦结构光场普遍应用于精密光学的三维测量,其正弦性直接或间接影响三维测量的精度。根据正弦条纹的周期性和对称性等几何特征,以......
基于4H-SiC材料的微机电系统（MEMS）器件（如压力传感器、微波功率半导体器件等）在制造过程中，需要利用干法刻蚀技术对4H-SiC材料进行微加......
为了更好地了解表面增强拉曼光谱(SERS)的机制，并进一步提高增强因子，研制了具有高稳定性的纳米劈裂装置及芯片。结合纳米劈裂技术及......
利用琼斯矩阵分析了大角度入射情况时薄膜诱导的偏振像差，通过理论推导提出了减小薄膜诱导偏振像差的膜系设计方法，即在满足最基本的......
多参数联合优化是光刻分辨率增强技术的发展方向。提出了一种以光刻胶三维形貌差异为评价目标的光刻多参数联合优化方法。以多个深......
针对大阵列CCD工艺制作过程中光刻大面积图形曝光的需求，提出了一种适用于光刻拼接的图形补偿方法。图形拼接处进行相反的补偿设计0......
Non-coplanar multi-beam interference produced by one triangular pyramid for fabricating photonic cry
A method for fabricating three-dimensional (3D) photonic crystals (PhCs) easily and simply, by using a visible light (~5......
本文设计了一种新系列的紫外或远紫外激光光刻物镜,它与国内外已有的紫外物镜相比,在365nm以下的光谱区,具有更宽的光谱工作带宽和......
利用GaN高电子迁移率晶体管（HEMT）的栅控特性和锆钛酸铅（PZT）铁电薄膜的光伏效应，在HEMT器件的栅极处沉积一层PZT铁电薄膜，提出了一种新......
波片通常用于测量光学系统的偏振效应。对于大入射角的超高数值孔径（NA）成像系统，待测光不再平行于系统光轴，而是与系统光轴有较大夹角......
Directed self-assembly (DSA) emerges as one of the most promising new patterning techniques for single digit miniaturiza......
提出一种基于差分进化算法和微反射镜阵列(MMA)光源模型的光刻机匹配方法。加入MMA光源模型,利用差分进化算法优化微反射镜光斑分......
Discretely-supported nanoimprint lithography for patterning the high-spatial-frequency stepped surfa
Non-planar morphology is a common feature of devices applied in various physical fields,such as light or fluid,which pos......
描述了用高功率脉冲激光打靶产生的等离子体作为软Ｘ射线源而进行的接近式软Ｘ射线光刻研究，采用负性辐射线光刻胶聚氯甲基苯乙烯，得到了......
相移点衍射干涉仪利用测试波和参考波的横向错位产生载波干涉条纹,因此测量结果中必然引入一定的系统误差。在分析相移点衍射干涉......
提出了一种基于多偏振照明的浸没式光刻机投影物镜高阶波像差快速检测技术。通过采用一元线性采样方式,在不同偏振照明条件下采集......
A new sub-wavelength metallic film lens configuration is proposed, which is embedded in a thin ideal metal film, and its......
Microarray technology has been proved to be greatly helpful for biomedical and biological diagnosis. And the evaluation ......
In this work,different effects of substrates on the morphologies of single-walled carbon nanotubes(SWNTs)are studied.SWN......
Confinement-induced nanocrystal alignment of conjugated polymer by the soft-stamped nanoimprint lith
Soft-stamped nanoimprint lithography(NIL) is considered as one of the most effective processes of nanoscale patterning b......
Topologically patterning of polyvinyl alcohol microstructures for vertical-/hybrid-aligned nematic l
We demonstrate a soft lithography approach for fabrication of a topographically patterned polyvinyl alcohol(PVA) liquid-......
Fabrication of Anti-reflecting Si Nano-structures with Low Aspect Ratio by Nano-sphere Lithography T
Nano-structured photon management is currently an interesting topic since it can enhance the optical absorption and redu......
Block copolymer lithography is emerging as one of the leading technologies for patterning nanoscale dense features. In a......
A novel strategy to prepare LDH networks loaded carbon structure by C-MEMS techniques for glucose de
NiAl-layered double hydroxide(NiAl-LDH) networks loaded carbon microcylinder(CMC) hybrid was synthesized for the first t......
In the high precision image measurement system,the verticality error between the axis of the shooting system and the mea......
The front cover shows the lithography area in a class1 0 clean room,one part of theNanjing Electronic Devices Institute......
JEOL JBX- 5 0 0 0 L S是矢量扫描的电子束曝光机 .系统采用 L a B6 灯丝 ,可以工作在 2 5 k V和 5 0 k V的加速电压下 .对该系统......
日前,纳米压印光刻(nano-imprint lithography)技术的主要供应商之一Molecular Imprints Inc.(MII)宣称,纳米压印技术已被纳入200......
For 193-nm lithography,water proves to be a suitable immersion fluid.ArF immersion offers the potential to extend conve......
With the increased design complexities brought in by applying different Reticle Enhancement Technologies (RETs) in nanom......
A novel nano-scale alignment technique based on Moiré signal for room-temperature imprint lithography in the submicron ......
对分步重复投影半导体光刻机相位光栅对准信号作了详细的分析,提出了更加合理精确的计算模型,并与其他论文中的实验数据作了初步......
Light emitting devices based on Si nanoclusters:the integration with a photonic crystal and electrol
We present the properties and potentialities of light emitting devices based on amorphous Si nanoclusters. Amorphousnano......
Introduction During the last two decades,organic light-emitting diodes (OLED) have attracted considerable interest owing......
Structural observation of CdSt_2 LB films and nanometer scale lithography by atomic force microscopy
Langmuir-Blodgett (LB) films and related thin organic films have been the objects ofincreasing technological and scient......
March 19-20,2009 Shanghai,ChinaWelcome to ISTC/CSTIC 2009.ISTC/CSTIC iS intended to be the largest annualinternational c......
Dip-pen nanolithography is a new scanning probe lithography (SPL) technique based on atomic force microscopy (AFM), and ......
Symmetric tapered dielectric structures in metal have demonstrated applications such as the nanofocusing of surface plas......
We have fabricated In0.53Ga0.47As/AlAs/InP resonant tunneling diodes(RTDs) based on the air-bridge technology by using e......
EV Group Introduces New Suite of Aligners and Measurement Systems for 3D IC and other Advanced Semic
SHANGHAI, CHINA / ST. FLORIAN, AUS-TRIA, March 17, 2009-EV Group (EVG), a leadingsupplier of wafer bonding and lithograp......
